IP Library › Granted Patent US 5,256,505
Granted Patent Utility
US 5,256,505 · App. 07/933,393

Lithographical mask for controlling the dimensions of resist patterns

Inventors: Jang Fung Chen, James A. Matthews
Patented Case View Patent ↗
Granted: Oct 26, 1993 Filed: Aug 21, 1992
Inventors
Jang Fung Chen
James A. Matthews
Assignee (at issue)
MicroUnity Systems Engineering, Inc.

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Quick Facts
Patent No.
US 5,256,505
App. No.
07/933,393
Filed
1992-08-21
Granted
1993-10-26
Kind
A