Granted Patent
Utility
US 5,340,700 · App. 08/149,122
Method for improved lithographic patterning in a semiconductor fabrication process
Inventors:
Jang Fung Chen, James A. Matthews
Patented Case
View Patent ↗
Granted: Aug 23, 1994
Filed: Nov 3, 1993
Inventors
Jang Fung Chen
James A. Matthews
Assignee (at issue)
MicroUnity Systems Engineering, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.