Granted Patent
Utility
US 5,391,506 · App. 08/009,747
Manufacturing method for semiconductor devices with source/drain formed in substrate projection.
Inventors:
Yoshihide Tada, Hiroyasu Kunitomo
Patented Case
View Patent ↗
Granted: Feb 21, 1995
Filed: Jan 27, 1993
Inventors
Yoshihide Tada
Hiroyasu Kunitomo
Assignee (at issue)
Kawasaki Steel Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.