IP Library › Granted Patent US 5,413,941
Granted Patent Utility
US 5,413,941 · App. 08/178,663

Optical end point detection methods in semiconductor planarizing polishing processes

Inventors: Daniel A. Koos, Scott Meikle
Patented Case View Patent ↗
Granted: May 9, 1995 Filed: Jan 6, 1994
Inventors
Daniel A. Koos
Scott Meikle
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 5,413,941
App. No.
08/178,663
Filed
1994-01-06
Granted
1995-05-09
Kind
A