Granted Patent
Utility
US 5,422,338 · App. 08/180,792
Layer-by-layer vapor deposition method for forming a high Tc superconductor thin film device
Inventor:
Yukio Watanabe
Patented Case
View Patent ↗
Granted: Jun 6, 1995
Filed: Jan 10, 1994
Inventor
Yukio Watanabe
Assignee (at issue)
MITSUBISHI CHEMICAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.