Granted Patent
Utility
US 5,447,598 · App. 08/109,108
Process for forming resist mask pattern
Inventors:
Satoru Mihara, Kouji Nozaki, Yukari Mihara
Patented Case
View Patent ↗
Granted: Sep 5, 1995
Filed: Aug 19, 1993
Inventors
Satoru Mihara
Kouji Nozaki
Yukari Mihara
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.