Granted Patent
Utility
US 5,447,825 · App. 08/299,079
Method for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydes
Inventors:
Mineo Nishi, Koji Nakano, Yoshihiro Takada
Patented Case
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Granted: Sep 5, 1995
Filed: Aug 31, 1994
Inventors
Mineo Nishi
Koji Nakano
Yoshihiro Takada
Assignee (at issue)
MITSUBISHI CHEMICAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.