Granted Patent
Utility
US 5,466,641 · App. 08/079,123
Process for forming polycrystalline silicon film
Inventors:
Tetushi Shimizu, Munetaka Koda, Yoshikatsu Shida, Jun Kawaguchi, Yoshio Kaneko
Patented Case
View Patent ↗
Granted: Nov 14, 1995
Filed: Jun 14, 1993
Inventors
Tetushi Shimizu
Munetaka Koda
Yoshikatsu Shida
Jun Kawaguchi
Yoshio Kaneko
Assignee (at issue)
Kawasaki Steel Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.