IP Library › Granted Patent US 5,521,424
Granted Patent Utility
US 5,521,424 · App. 08/361,536

Semiconductor device having a silicon oxide film containing fluorine atoms

Inventors: Kazuyoshi Ueno, Tetsuya Homma
Patented Case View Patent ↗
Granted: May 28, 1996 Filed: Dec 22, 1994
Inventors
Kazuyoshi Ueno
Tetsuya Homma
Assignee (at issue)
NEC CORPORATION

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Quick Facts
Patent No.
US 5,521,424
App. No.
08/361,536
Filed
1994-12-22
Granted
1996-05-28
Kind
A