Granted Patent
Utility
US 5,529,885 · App. 08/253,776
Negative photosensitive composition and method for forming patterns using the composition
Inventors:
Tameichi Ochiai, Ryuichiro Takasaki, Yasuhiro Kameyama, Shichiro Takahashi
Patented Case
View Patent ↗
Granted: Jun 25, 1996
Filed: Jun 3, 1994
Inventors
Tameichi Ochiai
Ryuichiro Takasaki
Yasuhiro Kameyama
Shichiro Takahashi
Assignee (at issue)
MITSUBISHI CHEMICAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.