Granted Patent
Utility
US 5,529,958 · App. 08/301,413
Method of manufacturing a semiconductor device having silicide
Inventor:
Akihiro Yaoita
Patented Case
View Patent ↗
Granted: Jun 25, 1996
Filed: Sep 8, 1994
Inventor
Akihiro Yaoita
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.