IP Library › Granted Patent US 5,578,510
Granted Patent Utility
US 5,578,510 · App. 08/547,157

Method of making an isolation layer stack semiconductor device

Inventor: Tomofune Tani
Patented Case View Patent ↗
Granted: Nov 26, 1996 Filed: Oct 24, 1995
Inventor
Tomofune Tani
Assignee (at issue)
NIPPON STEEL CORPORATION

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Quick Facts
Patent No.
US 5,578,510
App. No.
08/547,157
Filed
1995-10-24
Granted
1996-11-26
Kind
A