IP Library › Granted Patent US 5,581,097
Granted Patent Utility
US 5,581,097 · App. 08/321,736

Method of fabricating semiconductor device using shared contact hole masks and semiconductor device using same

Inventor: Masaaki Nariishi
Patented Case View Patent ↗
Granted: Dec 3, 1996 Filed: Oct 12, 1994
Inventor
Masaaki Nariishi
Assignee (at issue)
Kawasaki Steel Corporation

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Quick Facts
Patent No.
US 5,581,097
App. No.
08/321,736
Filed
1994-10-12
Granted
1996-12-03
Kind
A