Granted Patent
Utility
US 5,607,509 · App. 08/635,527
High impedance plasma ion implantation apparatus
Inventors:
Robert W. Schumacher, Jesse N. Matossian, Dan M. Goebel
Patented Case
View Patent ↗
Granted: Mar 4, 1997
Filed: Apr 22, 1996
Inventors
Robert W. Schumacher
Jesse N. Matossian
Dan M. Goebel
Assignee (at issue)
HUGHES ELECTRONICS LIMITED
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.