IP Library › Granted Patent US 5,663,893
Granted Patent Utility
US 5,663,893 · App. 08/433,730

Method for generating proximity correction features for a lithographic mask pattern

Inventors: Kurt E. Wampler, Thomas Laidig
Patented Case View Patent ↗
Granted: Sep 2, 1997 Filed: May 3, 1995
Inventors
Kurt E. Wampler
Thomas Laidig
Assignee (at issue)
MicroUnity Systems Engineering, Inc.

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Quick Facts
Patent No.
US 5,663,893
App. No.
08/433,730
Filed
1995-05-03
Granted
1997-09-02
Kind
A