IP Library › Granted Patent US 5,677,236
Granted Patent Utility
US 5,677,236 · App. 08/605,609

Process for forming a thin microcrystalline silicon semiconductor film

Inventors: Kimihiko Saitoh, Nobuyuki Ishiguro, Mitsuru Sadamoto, Shin Fukuda, Yoshinori Ashida, Nobuhiro Fukuda
Patented Case View Patent ↗
Granted: Oct 14, 1997 Filed: Feb 22, 1996
Inventors
Kimihiko Saitoh
Nobuyuki Ishiguro
Mitsuru Sadamoto
Shin Fukuda
Yoshinori Ashida
Nobuhiro Fukuda
Assignee (at issue)
Mitsui Toatsu Chemicals, Incorporated

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Quick Facts
Patent No.
US 5,677,236
App. No.
08/605,609
Filed
1996-02-22
Granted
1997-10-14
Kind
A