Granted Patent
Utility
US 5,705,025 · App. 08/539,198
Method for dry etching of a semiconductor substrate
Inventors:
Ralf Dietrich, Gerhard Franz
Patented Case
View Patent ↗
Granted: Jan 6, 1998
Filed: Oct 4, 1995
Inventors
Ralf Dietrich
Gerhard Franz
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.