Granted Patent
Utility
US 5,711,812 · App. 08/469,401
Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processes
Inventors:
David L. Chapek, Susan Felch, Michael William Kissick, Shamim M. Malik, Tienyu Sheng
Patented Case
View Patent ↗
Granted: Jan 27, 1998
Filed: Jun 6, 1995
Inventors
David L. Chapek
Susan Felch
Michael William Kissick
Shamim M. Malik
Tienyu Sheng
Assignee (at issue)
Varian, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.