IP Library › Granted Patent US 5,724,132
Granted Patent Utility
US 5,724,132 · App. 08/736,582

Extraneous substance inspection apparatus for patterned wafer

Inventors: Yoshio Morishige, Hisato Nakamura, Tetsuya Watanabe
Patented Case View Patent ↗
Granted: Mar 3, 1998 Filed: Oct 24, 1996
Inventors
Yoshio Morishige
Hisato Nakamura
Tetsuya Watanabe
Assignee (at issue)
Hitachi Electronics Engineering Co., Ltd.

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Quick Facts
Patent No.
US 5,724,132
App. No.
08/736,582
Filed
1996-10-24
Granted
1998-03-03
Kind
A