Granted Patent
Utility
US 5,780,329 · App. 08/832,245
Process for fabricating a moderate-depth diffused emitter bipolar transistor in a BICMOS device without using an additional mask
Inventors:
Todd A. Randazzo, John J. Seliskar
Patented Case
View Patent ↗
Granted: Jul 14, 1998
Filed: Apr 3, 1997
Inventors
Todd A. Randazzo
John J. Seliskar
Assignee (at issue)
Symbios, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.