Granted Patent
Utility
US 5,821,014 · App. 08/808,587
Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask
Inventors:
Jang Fung Chen, Kurt E. Wampler, Thomas Laidig
Patented Case
View Patent ↗
Granted: Oct 13, 1998
Filed: Feb 28, 1997
Inventors
Jang Fung Chen
Kurt E. Wampler
Thomas Laidig
Assignee (at issue)
MicroUnity Systems Engineering, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.