Granted Patent
Utility
US 5,834,827 · App. 08/748,835
Thin film semiconductor device, fabrication method thereof, electronic device and its fabrication method
Inventors:
Mitsutoshi Miyasaka, Kiyofumi Kitawada, Minoru Matsuo, Seiichiro Higashi, Tokuroh Ozawa, Satoshi Takenaka, Yojiro Matsueda, Takashi Nakazawa, Hiroyuki Ohshima, Satoshi Inoue
Patented Case
View Patent ↗
Granted: Nov 10, 1998
Filed: Nov 14, 1996
Inventors
Mitsutoshi Miyasaka
Kiyofumi Kitawada
Minoru Matsuo
Seiichiro Higashi
Tokuroh Ozawa
Satoshi Takenaka
Yojiro Matsueda
Takashi Nakazawa
Hiroyuki Ohshima
Satoshi Inoue
Assignee (at issue)
SEIKO EPSON CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.