Granted Patent
Utility
US 5,847,959 · App. 08/789,246
Method and apparatus for run-time correction of proximity effects in pattern generation
Inventors:
Lee H. Veneklasen, Robert A. Innes, Sergey Babin, David Trost, Jeffrey A. Varner
Patented Case
View Patent ↗
Granted: Dec 8, 1998
Filed: Jan 28, 1997
Inventors
Lee H. Veneklasen
Robert A. Innes
Sergey Babin
David Trost
Jeffrey A. Varner
Assignee (at issue)
ETEC SYSTEMS, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.