Granted Patent
Utility
US 5,863,602 · App. 08/862,398
Method for capturing gaseous impurities and semiconductor device manufacturing apparatus
Inventors:
Hirohito Watanabe, Toshiyuki Hirota, Takashi Ogawa
Patented Case
View Patent ↗
Granted: Jan 26, 1999
Filed: May 23, 1997
Inventors
Hirohito Watanabe
Toshiyuki Hirota
Takashi Ogawa
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.