IP Library › Granted Patent US 5,916,011
Granted Patent Utility
US 5,916,011 · App. 08/780,113

Process for polishing a semiconductor device substrate

Inventors: Sung-Cheol Kim, Rajeev Bajaj, Mark A. Zaleski
Patented Case View Patent ↗
Granted: Jun 29, 1999 Filed: Dec 26, 1996
Inventors
Sung-Cheol Kim
Rajeev Bajaj
Mark A. Zaleski
Assignee (at issue)
Motorola, Inc.

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Quick Facts
Patent No.
US 5,916,011
App. No.
08/780,113
Filed
1996-12-26
Granted
1999-06-29
Kind
A