Granted Patent
Utility
US 5,919,311 · App. 08/749,906
Control of SiO.sub.2 etch rate using dilute chemical etchants in the presence of a megasonic field
Inventors:
Larry W. Shive, Igor J. Malik
Patented Case
View Patent ↗
Granted: Jul 6, 1999
Filed: Nov 15, 1996
Inventors
Larry W. Shive
Igor J. Malik
Assignee (at issue)
MEMC Electronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.