IP Library › Granted Patent US 5,925,719
Granted Patent Utility
US 5,925,719 · App. 08/879,089

Photoresist developable in aqueous base made from acid-functional .beta.-hydroxy thiol resin

Inventors: John Scott Hallock, Donald Herr
Patented Case View Patent ↗
Granted: Jul 20, 1999 Filed: Jun 19, 1997
Inventors
John Scott Hallock
Donald Herr
Assignee (at issue)
MacDermid, Incorporated

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Quick Facts
Patent No.
US 5,925,719
App. No.
08/879,089
Filed
1997-06-19
Granted
1999-07-20
Kind
A