Granted Patent
Utility
US 5,938,857 · App. 09/131,552
Method for rinsing and drying a substrate
Inventors:
Shuji Fujiwara, Toshiyuki Hirota
Patented Case
View Patent ↗
Granted: Aug 17, 1999
Filed: Aug 10, 1998
Inventors
Shuji Fujiwara
Toshiyuki Hirota
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.