Granted Patent
Utility
US 5,953,629 · App. 08/706,679
Method of thin film forming on semiconductor substrate
Inventors:
Nobuya Imazeki, Masaaki Oda, Izumi Nakayama
Patented Case
View Patent ↗
Granted: Sep 14, 1999
Filed: Sep 6, 1996
Inventors
Nobuya Imazeki
Masaaki Oda
Izumi Nakayama
Assignee (at issue)
Vacuum Metallurgical Co., Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.