Granted Patent
Utility
US 5,976,618 · App. 08/939,923
Process for forming silicon dioxide film
Inventors:
Shun-ichi Fukuyama, Daitei Shin, Yuki Komatsu, Hideki Harada
Patented Case
View Patent ↗
Granted: Nov 2, 1999
Filed: Sep 29, 1997
Inventors
Shun-ichi Fukuyama
Daitei Shin
Yuki Komatsu
Hideki Harada
Assignees (at issue)
Fujitsu Limited
Kyushu Fujitsu Electronics Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.