Granted Patent
Utility
US 6,020,292 · App. 09/082,564
Non-corrosive cleaning composition for removing plasma etching residues
Inventors:
Kenji Honda, Taishih Maw
Patented Case
View Patent ↗
Granted: Feb 1, 2000
Filed: May 21, 1998
Inventors
Kenji Honda
Taishih Maw
Assignee (at issue)
Olin Microelectronic Chemicals, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.