Granted Patent
Utility
US 6,054,373 · App. 09/006,996
Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate
Inventors:
Hiroshi Tomita, Hisashi Muraoka, Ryuji Takeda
Patented Case
View Patent ↗
Granted: Apr 25, 2000
Filed: Jan 14, 1998
Inventors
Hiroshi Tomita
Hisashi Muraoka
Ryuji Takeda
Assignees (at issue)
Kabushiki Kaisha Toshiba
PUREX CO., LTD.
Toshiba Ceramics Co., Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.