Granted Patent
Utility
US 6,090,458 · App. 08/814,960
Method and apparatus for film formation by chemical vapor deposition
Inventor:
Shingo Murakami
Patented Case
View Patent ↗
Granted: Jul 18, 2000
Filed: Mar 10, 1997
Inventor
Shingo Murakami
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.