Granted Patent
Utility
US 6,110,637 · App. 08/386,136
Photoresists which are suitable for producing sub-micron size structures
Inventors:
Recai Sezi, Rainer Leuschner, Horst Borndoerfer, Michael Sebald, Siegfried Birkle, Hellmut Ahne
Patented Case
View Patent ↗
Granted: Aug 29, 2000
Filed: Feb 9, 1995
Inventors
Recai Sezi
Rainer Leuschner
Horst Borndoerfer
Michael Sebald
Siegfried Birkle
Hellmut Ahne
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.