Granted Patent
Utility
US 6,114,071 · App. 09/055,355
Method of fine feature edge tuning with optically-halftoned mask
Inventors:
J. Fung Chen, Kurt E. Wampler, Tom Laidig
Patented Case
View Patent ↗
Granted: Sep 5, 2000
Filed: Apr 6, 1998
Inventors
J. Fung Chen
Kurt E. Wampler
Tom Laidig
Assignee (at issue)
ASML Masktools Netherlands B.V.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.