Granted Patent
Utility
US 6,150,670 · App. 09/450,546
Process for fabricating a uniform gate oxide of a vertical transistor
Inventors:
Johnathan E. Faltermeier, Ulrike Gruening, Suryanarayan G. Hegde, Rajarao Jammy, Brian Lee, Helmut Tews
Patented Case
View Patent ↗
Granted: Nov 21, 2000
Filed: Nov 30, 1999
Inventors
Johnathan E. Faltermeier
Ulrike Gruening
Suryanarayan G. Hegde
Rajarao Jammy
Brian Lee
Helmut Tews
Assignees (at issue)
International Business Machines Corporation
Infineon Technologies North America Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.