Granted Patent
Utility
US 6,184,134 · App. 09/506,892
Dry process for cleaning residues/polymers after metal etch
Inventors:
Nirmal Chaudhary, Xian J. Ning, George Stojakovic
Patented Case
View Patent ↗
Granted: Feb 6, 2001
Filed: Feb 18, 2000
Inventors
Nirmal Chaudhary
Xian J. Ning
George Stojakovic
Assignee (at issue)
Infineon Technologies North America Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.