IP Library › Granted Patent US 6,197,603
Granted Patent Utility
US 6,197,603 · App. 09/157,153

Semiconductor device and manufacturing method thereof including a probe test step and a burn-in test step

Inventors: Ryuji Kohno, Tetsuo Kumazawa, Makoto Kitano, Akihiko Ariga, Yuji Wada, Naoto Ban, Shuji Shibuya, Yasuhiro Motoyama, Kunio Matsumoto, Susumu Kasukabe, Terutaka Mori, Hidetaka Shigi, Takayoshi Watanabe
Patented Case View Patent ↗
Granted: Mar 6, 2001 Filed: Sep 18, 1998
Inventors
Ryuji Kohno
Tetsuo Kumazawa
Makoto Kitano
Akihiko Ariga
Yuji Wada
Naoto Ban
Shuji Shibuya
Yasuhiro Motoyama
Kunio Matsumoto
Susumu Kasukabe
Terutaka Mori
Hidetaka Shigi
Takayoshi Watanabe
Assignee (at issue)
HITACHI, LTD.

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Quick Facts
Patent No.
US 6,197,603
App. No.
09/157,153
Filed
1998-09-18
Granted
2001-03-06
Kind
A