Granted Patent
Utility
US 6,221,712 · App. 09/385,805
Method for fabricating gate oxide layer
Inventors:
Kuo-Tai Huang, Michael W C Huang, Tri-Rung Yew
Patented Case
View Patent ↗
Granted: Apr 24, 2001
Filed: Aug 30, 1999
Inventors
Kuo-Tai Huang
Michael W C Huang
Tri-Rung Yew
Assignee (at issue)
WINBOND ELECTRONICS CORP.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.