Granted Patent
Utility
US 6,242,305 · App. 09/427,404
Process for fabricating a bit-line using buried diffusion isolation
Inventors:
David K. Foote, Hideki Komori, Bharath Rangarajan, Fei Wang
Patented Case
View Patent ↗
Granted: Jun 5, 2001
Filed: Oct 25, 1999
Inventors
David K. Foote
Hideki Komori
Bharath Rangarajan
Fei Wang
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.