Granted Patent
Utility
US 6,251,216 · App. 09/212,411
Apparatus and method for plasma processing
Inventors:
Hideaki Okamura, Shinichi Imai, Nobuhiro Jiwari, Yoko Tohmori
Patented Case
View Patent ↗
Granted: Jun 26, 2001
Filed: Dec 16, 1998
Inventors
Hideaki Okamura
Shinichi Imai
Nobuhiro Jiwari
Yoko Tohmori
Assignee (at issue)
Matsushita Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.