Granted Patent
Utility
US 6,271,151 · App. 08/885,140
Method and apparatus for controlling the thickness of a gate oxide in a semiconductor manufacturing process
Inventor:
Donald L. Wollesen
Patented Case
View Patent ↗
Granted: Aug 7, 2001
Filed: Jun 30, 1997
Inventor
Donald L. Wollesen
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.