IP Library › Granted Patent US 6,290,864
Granted Patent Utility
US 6,290,864 · App. 09/427,841

Fluoride gas etching of silicon with improved selectivity

Inventors: Satyadev Patel, Gregory P. Schaadt, Douglas B. MacDonald
Patented Case View Patent ↗
Granted: Sep 18, 2001 Filed: Oct 26, 1999
Inventors
Satyadev Patel
Gregory P. Schaadt
Douglas B. MacDonald
Assignee (at issue)
Reflectivity, Inc.

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Quick Facts
Patent No.
US 6,290,864
App. No.
09/427,841
Filed
1999-10-26
Granted
2001-09-18
Kind
A