IP Library › Granted Patent US 6,291,118
Granted Patent Utility
US 6,291,118 · App. 09/480,266

Elimination of proximity effect in photoresist

Inventors: Tsai-Sheng Gau, Chang-Ming Dai
Patented Case View Patent ↗
Granted: Sep 18, 2001 Filed: Jan 11, 2000
Inventors
Tsai-Sheng Gau
Chang-Ming Dai
Assignee (at issue)
Industrial Technology Research Institute

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,291,118
App. No.
09/480,266
Filed
2000-01-11
Granted
2001-09-18
Kind
A