Granted Patent
Utility
US 6,297,153 · App. 09/185,089
Method of manufacturing barrier metal film of semiconductor device and method of manufacturing metal interconnection film of semiconductor device using the same
Inventors:
Jong Min Park, Sang-Woo Lee, Byoung-ju Yoo
Patented Case
View Patent ↗
Granted: Oct 2, 2001
Filed: Nov 3, 1998
Inventors
Jong Min Park
Sang-Woo Lee
Byoung-ju Yoo
Assignee (at issue)
SAMSUNG DISPLAY CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.