Granted Patent
Utility
US 6,305,314 · App. 09/466,100
Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
Inventors:
Ofer Sneh, Carl Galewski
Patented Case
View Patent ↗
Granted: Oct 23, 2001
Filed: Dec 17, 1999
Inventors
Ofer Sneh
Carl Galewski
Assignee (at issue)
Genvs, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.