Granted Patent
Utility
US 6,354,240 · App. 09/152,238
Plasma etch reactor having a plurality of magnets
Inventors:
Stephen P. DeOrnellas, Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson
Patented Case
View Patent ↗
Granted: Mar 12, 2002
Filed: Sep 11, 1998
Inventors
Stephen P. DeOrnellas
Leslie G. Jerde
Alferd Cofer
Robert C. Vail
Kurt A. Olson
Assignee (at issue)
TEGAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.