IP Library › Granted Patent US 6,360,012
Granted Patent Utility
US 6,360,012 · App. 09/344,664

In situ projection optic metrology method and apparatus

Inventor: Justin Kreuzer
Patented Case View Patent ↗
Granted: Mar 19, 2002 Filed: Jun 25, 1999
Inventor
Justin Kreuzer
Assignee (at issue)
SVG Lithography Systems, Inc.

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Quick Facts
Patent No.
US 6,360,012
App. No.
09/344,664
Filed
1999-06-25
Granted
2002-03-19
Kind
B1