IP Library Granted Patent US 6,365,302
Granted Patent Utility
US 6,365,302 · App. 09/551,594

Pattern for measuring focus of light exposing apparatus and method thereof

Inventor: Hyun Jo Yang
Patented Case View Patent ↗
Granted: Apr 2, 2002 Filed: Apr 17, 2000
Inventor
Hyun Jo Yang
Assignee (at issue)
Hyundai Electronics Industries Co. Ltd.

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Quick Facts
Patent No.
US 6,365,302
App. No.
09/551,594
Filed
2000-04-17
Granted
2002-04-02
Kind
B1