Granted Patent
Utility
US 6,366,410 · App. 09/125,621
Reticular objective for microlithography-projection exposure installations
Inventors:
Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster
Patented Case
View Patent ↗
Granted: Apr 2, 2002
Filed: Aug 12, 1999
Inventors
Jorg Schultz
Johannes Wangler
Karl-Heinz Schuster
Assignee (at issue)
Carl Zeiss Stiftung
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.